- Power types
- If magnetron power supply; Pulse bias power supply
- Vacuum acquisition system
- Diffusion pump + roots pump + mechanical pump + maintenance pump (specific model can be configured according to customer requirements)
- Cooling Types
- Water cooling
Qingdao youbaiyu dedicated vacuum coating equipment for 11 years (SINCE 2009)
Arc and composite vacuum magnetron sputtering coating equipment by using electric arc ion plating and dc magnetron sputtering, intermediate frequency magnetron sputtering technique and pulse bias technology combined with the same coating machine, it can separate with arc or separate with magnetron sputtering coating, can also take advantage of the two technologies play a main role at different stages in the process of coating, such as in the initial use of arc coating of high energy particles bombarding cleaning and hit the bottom, to increase the film adhesion; Then sputtering with medium frequency middle main layer, can get fine and smooth tissue, can meet the needs of multifunctional coating.
The evaporative magnetron sputtering equipment is equipped with efficient resistance heating evaporation device and advanced cylinder or plane magnetron sputtering device. The organic combination of resistance heating evaporation coating technology and magnetron sputtering coating technology makes the equipment more suitable for a wide range of film layers with different properties.
Different parts to be plated are equipped with HVDC ion cleaning system and ac ion cleaning system. In particular, the high-density plasma of the ac ion cleaning system will clean the plated workpiece more thoroughly, so that the adhesion of the film and the workpiece significantly increased. The unique vertical double-door structure makes the loading and unloading of workpiece and plating material and coating process simultaneously, greatly improving the working effect.